Item: Aluminum sputtering target
Material: Aluminum
Purity: 99.6%
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries
a: solar photovoltaic application
b: electronic and semiconductor application
c: decoration and coating application etc.
d: large area glass coating: glass coating material & technology
Item: Flat Cr sputtering target for architectural glass and auto glass coating
Material: Chromium
Purity: 99%
Grain Size: ＜100μm
Technics: Hot isostatic pressing (HIP)
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: electronic and semiconductor field
c: decoration and mould field
d: optics coating materials, flat panel display, thin-film solar
Item: Pure Tantalum sputtering target
Material: Tantalum
Purity: 99.95%
Grain Size: ＜100μm
Technics: Hot isostatic pressing (HIP), Powder metallurgy
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: electronic and semiconductor field
c: decoration and mould field
d: optics coating materials
Advantages:
High hard texture
Low impurity content
Better heat dissipation
High tensile strength
