Item: Ti Nb Titanium Niobium alloy sputtering target for semiconductor industry
Material: Ti Nb
Grain Size: ＜100μm
Technics: Melting, Casting
Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications
Item: Thin film materials Chromium sputtering target Cr target
Material: Chromium (Cr)
Purity: 99.5%
Grain Size: ＜100μm
Technics: Hot isostatic pressing (HIP)
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: electronic and semiconductor field
c: decoration and mould field
d: optics coating materials, flat panel display, thin-film solar
Item: CD and DVD coating material Copper sputtering target
Material: Copper (Cu)
Purity: 99.995%
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: electronic and semiconductor field
c: decoration and mould field
d: advanced packing application
