Item: PVD coating target Al metal sputtering target applied on thin film solar panel
Purity: 99.99%
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries
a: solar photovoltaic application
b: electronic and semiconductor application
c: decoration and coating application
d: large area glass coating: glass coating material & technology
Item: Coating material high purity Cu sputtering target Copper target
Material: Copper
Purity: 99.995%~99.9999%
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: electronic and semiconductor field
c: decoration and mould field
d: advanced packing application
Copper is reddish and takes on a bright metallic luster. It is a malleable, ductile, and a good conductor of heat and electricity (second only to silver in electrical conductivity)
Melting point: 1084.6℃
Boiling point: 2562℃
Item: Titanium aluminum alloy sputtering target Copper target
Material: Titanium Aluminum
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process and Machine work
Application: Widely used in coating processing industries
a: LCD, photoelectric devices field
b: electronic and semiconductor field
c: decoration and mould field
