Item: High purity Zr zirconium sputtering target
Material: Zr zirconium
Purity: 99.8%
Grain Size: ＜100μm
Technics: Powder Metallurgy
Application: Widely used in coating processing industries
a: architectural glass, car using glass, graphic display field
b: decoration and mould field
c: optics coating materials
Advantages:
High hard texture
Low impurity content
Better heat dissipation
High tensile strength
Zirconium is rare metal with amazing corrosion resistance, high melting point, high hardness and high strength characteristics, widely used in aerospace, military project, nuclear reactions and atomic energy field.
Item: Tantalum planar sputtering target for vacuum coating
Material: Tantalum
Purity: 99.96%
Grain Size: ＜100μm
Technics: Hot isostatic pressing, Powder metallurgy
Application: Mainly used as coating, sputtering material
Item: Mo Molybdenum round sputtering target
Material: Molybdenum
Purity: 99.98%
Grain Size: ＜100μm
Technics: Hot isostatic pressing, Powder Metallurgy, Patented thermo-mechanical process
Application: Widely used in coating processing industries
a: solar photovoltaic application
b: electronic and semiconductor field
c: decoration and coating application etc.
