Item: Titanium Aluminum Silicon (Ti Al Si) sputtering target
Material: Ti Al Si
Technics: Hot isostatic pressing, Patented thermo-mechanical process
Application:
a: large area glass coating: glass coating material & technology
b: PV: thin film solar technology for solar reflective coatings
Item: High purity Silicon sputtering target
Material: Silicon (Si)
Purity: 99.5%
Technics: Powder metallurgy
Application:
a: The flat panel display coating industry
b: Tools & Decoration coating industry
c: Architectural grass/ automotive glass industry
d: Optical data/ magnetic data storage industry
e: Optical communication industry
f: Solar PV and heating industry
Item: Nickel sputtering target for magnetic data storage field
Material: Nickel (Ni)
Purity: 3N
Grain Size: ＜100μm
Technics: Vacuum melting, Patented thermo-mechanical process and machine work
Application: Widely used in coating processing industries
a: solar photovoltaic application
b: electronic and semiconductor application
c: decoration and coating application etc.
d: magnetic data storage application
